Hongdong Li, Australian National U., AU
Guang-You Xu, Tsinghua U., China
Hongbin Zha, Peking U., China
Hong Yan, City U. of Hong Kong, China
Xiaoyi Jiang, U. of Muenster, Germany
Hiroshi Sako, Hitachi Ltd., JP
Dai-Jin Kim, Pohang U. of Science and Technology, Korea
Muhammad Sarfraz, King Fahd U. of Petroleum and Minerals, Saudi Arabia
Shoupu Chen, Kodak Company, USA
Y. C. Tsai, Georgia Institute of Technology, USA
Peichung Shih, New Jersey Institute of Technology, USA
C. S. Chen, Academic Sinica, TW
Y. S. Huang, ITRI, TW
C. H. Hsieh, I-Shou U., TW
I. N. Manousakas, I-Shou U., TW
Y. K. Wang, Fu Jen Catholic U., TW
T. L. Chia, Ming Chuan U., TW
Timothy K. Shih. Tamkang U., TW
J. W. Hsieh , Yuan Ze U., TW
S. C. Cheng, National Taiwan Ocean U., TW
M. C. Liang, National U. of Kaohsiung, TW
J. S. Lee, National U. of Tainan, TW
G. B. Horng, National Chunghsing U, TW
C. C. Chiang, National Dong Hwa U., TW
S. W. Shih, National Chi Nan U., TW
Y. C. Lin, National Formosa U., TW
H. J. Lin, National Formosa U., TW
H. P. Wu, Yunlin U. of Science & Technology, TW
C. M. Wang, National Chin-Yi Institute of Technology, TW
W. Y. Chen, National Chin-Yi Institute of Technology, TW
H. M. Chen, National Kaohsiung U. of Applied Sciences, TW
T. Y. Chen, National Kaohsiung U. of Applied Sciences, TW
T. H. Chen, National Kaohsiung U. of Applied Sciences, TW
W. S. Huang, National Kaohsiung U. of Applied Sciences, TW
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